Nanofabrication R&D
As a CNF (Cornell Nanoscale Facility) researcher since 1998, my two major research projects were:- Developing a process for depositing crack-sensing electrodes onto Inconel specimens (part of a NASA Phase-I feasibility study for Smart Coatings for In-Situ Monitoring of Engine Components). This result was critical to obtaining the Phase-II SBIR grant.
- Developed a unique thick-film SU-8 photopolymer process for creating large & thick dual-layer structures (>500um) per layer (see middle picture above). These biocompatible devices are critical components for the commercially successful Transonic Nanoprobes.
As a result I'm familiar with standard lithographic processes, ranging from mask design & fabrication to resist processing , exposures via contact alignment (including both frontside & backside alignment), and liftoff. I've also used such wet processes such as KOH etching, and resist stripping; and I'm familiar with the Nanofab's metal deposition systems (E-beam & thermal), as well as their deep reactive ion etching system (Bosch process).
Finally, I am perhaps the most experienced CNF researcher in thick-film SU-8 processing.CNF Tools that I've trained on & used include:
Photolithography:
- EV620 Contact Aligner
- HTG Contact Aligner
- Manual Resist Spinners
- Mann PG3600 Mask Writer
- YES Image Reversal Oven
- YES Vapor Prime Oven
Thin Film Deposition
Computing:
- CATS Pattern Conversion and Proximity Correction Suite
- L-Edit CAD Software
- LinkCAD pattern preparation software
Packaging:
Thin Film Etching